Principle of
Linear Broad Beam Ion Sources

Broad beam ion sources can be used in a wide field of thin film technologies. Linear ACC-ion sources can be used both for industrial thin film technologies and for research and development. Compared to other linear ion sources, which deliver up to 2.0 mA ion beam current density, our ion sources is designed for ion current densities between 0.3 and 1.5 mAcm-2 but operate with a lot of different precursors from a cost effective and compact ion source.

Our Linear Broad Beam Ion Sources base on the ACC-Principle:

In contrary to a hot cathode plasma the ACC-Ion Sources generates the ion source plasma without a hot and plasmachemically unstable filament by a magnetic field induced cold cathode discharge at nearly 50 kHz using the patented arrangement of two so called "Alternating Cathodes".

The ion beam is extracted by a two grid graphite extraction system. A filament neutralizer can be used to neutralise the ion beam.

Principle of the Linear Broad Beam Ion Sources

More informations about parameters, components, software and optional components you can get, if you download our paper about the Linear Broad Beam Ion Sources.

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