of Ion Source JENION ACC-40 IS

The compact Broad Ion Beam Source JENION ACC-40 IS generates an ion beam for applications in the fields of:

  • Ion Beam Sputtering for thin film deposition,

  • Nano technology, ion beam nanoscale surface modification, ion beam controlled textured film growth, crystal growth,

  • Ion Beam Assisted Deposition (IBAD) with noble gases and with oxygen (oxides), nitrogen (nitrides), or with hydrocarbons (carbides, diamond like carbon),

  • Reactive Ion Beam Etching (RIBE) with oxygen (polymers) or fluorocarbons (semiconductors, quartz glass),

  • Helium and hydrogen ion source for basic research,

  • Bio-medical surface preparation with molecular ions,

in a wide ion energy range from 50 to 1000 eV.

More informations about Ion Beam Assisted Deposition, Reactive Ion Beam Etching, Bio-Medical Surface Preparation, Direct Ion Beam Depostion and Ion Implantation with our Ion Source JENION ACC-40-IS you can get, if you download our paper about the Ion Source JENION ACC-40-IS.

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