of Ion Source JENION ACC-40 IS
The compact Broad Ion Beam Source JENION ACC-40 IS generates an ion beam for applications in the fields of:
in a wide ion energy range from 50 to 1000 eV.
Ion Beam Sputtering for thin film deposition,
Nano technology, ion beam nanoscale surface modification, ion beam controlled textured film growth, crystal growth,
Ion Beam Assisted Deposition (IBAD) with noble gases and with oxygen (oxides), nitrogen (nitrides), or with hydrocarbons (carbides, diamond like carbon),
Reactive Ion Beam Etching (RIBE) with oxygen (polymers) or fluorocarbons (semiconductors, quartz glass),
Helium and hydrogen ion source for basic research,
Bio-medical surface preparation with molecular ions,
More informations about Ion Beam Assisted Deposition, Reactive Ion Beam Etching, Bio-Medical Surface Preparation, Direct Ion Beam Depostion and Ion Implantation with our Ion Source JENION ACC-40-IS you can get, if you download our paper about the Ion Source JENION ACC-40-IS.