References

  1. H. Schlemm, "A radio frequency bandpass mass filter for broad ion beams", J. Vac. Sci. Techn. A. Jan./Febr. 1996, 223
  2. H. Schlemm ,"Compact broad beam ion implantation of 25 keV N+ in silicon", in: Proceedings of the 11. Int. Conf. on Ion Implantation Technology, Austin Texas, 1996, Ed. E. Ishida, et. al. IEEE Catalog No. 96TH8182, (1996) 400
  3. H. Schlemm, F. Buchmann, "Mass separated Broad Beam Ion Implantation of 25 keV N+ in Titanium", Surf. and Coatings Technology, 97 (1997) 259-262
  4. H.Schlemm, D.Roth, "Broad beam Ion Implantation of Boron in Silicon with a compact Broad Beam Ion Implanter", Surface and Coatings Technology 114 (1999) 81 -84,
  5. H. Schlemm, H. Neumann, Deutsches Patent, DE 199 28 053 A1 (1999)
  6. H. Schlemm, D. Roth, "Atmospheric pressure plasma processing with microstructure electrodes and microplanar reactors", Surf. and Coatings Technology 142-144, (2001) 272-276,
  7. D. Roth, H. Schlemm, K.-H. Gericke, H. Schmidt-Böcking, Deutsches Patent DE 100 32 955 A1 (2000),
  8. "Large scale industrial silicon nitride deposition at photovoltaik cells with linear microwave plasma sources", H. Schlemm, A.Mai, S. Roth, D. Roth, K.-M. Baumgärtner, H.Muegge, contr. to PSE 2002 Garmisch Partenkirchen, to be published at Surf. Coatings Technology
  9. "Ion beam impurity analysis of radio-frequency mass filtered broad ion beams", Rev. Of Sci. Instruments, vol. 69, No.2 (1999) 1191,
  10. W. J. Soppe, J.Hong, W.M.M. Kessels, M.C.M. van de Sanden, W.M. Arnoldbik, H. Schlemm, C. Devilée, H. Rieffe, S.E.A. Schiermeier, J.H. Bultman and A.W. Weeber ,"ON COMBINING SURFACE AND BULK PASSIVATION OF SiNx:H LAYERS FOR mc-Si SOLAR CELLS", to be published by IEEE 2002

 

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