Recent projects and developments

  • Ion beam impurity analysis of mass filtered broad ion beams (project with Institut for Surface Modification, Leipzig, [9],1998);
  • Reactive ion beam etching (RIBE) of quartz glass with ACC-ion sources, max. etch rate 1µm/min, (contribution to projects at Institut for Surface Modification, Leipzig, 1999),
  • Development of microstructured and other electrode systems for plasma generation at high pressure up to atmospheric pressure (contribution to a bmbf-project of Roth&Rau AG, Hohenstein-Ernstthal, [6,7],1999 2001),
  • Refinement of microwave plasma sources for use in industrial photovoltaik thin film deposition (contribution to developments of Roth&Rau AG, Hohenstein-Ernstthal [8], 2000 2002),
  • Solar cell technology of mc-silicon wafers (contribution to projects of Roth&Rau AG, Hohenstein-Ernstthal [10]), 2001 2003),
  • Development of a method for two dimensional ion beam profile control for broad ion beams (project together with Institut for Surface Modification, Leipzig, 2001-2003).

Future projects

Back to our Homepage


Thank you for visiting our website. Good bye.
Copyright © 2003 JENION. All Rights Reserved.                                                         Contents subject to change without notice.