Our History

  • 1994:
    JENION was founded, first tests of mass separating ion filters and hot cathode ion sources.
  • 1995-1996:
    Building up of our ion-beam-laboratory at Schorba near Jena, publication of the principle of the broad beam ion mass filter, development of the mass separating system, first broad ion beam implantation experiments.
  • 1997-1998:
    Start of the production of the mass separating broad ion beam systems, several publications on applications of these systems in ion implantation and surface modification .
  • 1999-2001:
    Development of the Alternating Cold Cathode principle leading to reactive gas stable plasma sources, production of first ACC- ion- and plasma sources (ACC-40 IS).
  • 2000 - 2001:
    Development of the alternating cold cathode plasma source ACC-80 PS as a low energy ion source.
  • 2001 - 2003:
    Development of multiple plasma probe analyzer for measuring plasma parameters and plasma an ion beam profiles ("Plasma Mon"),
    Development of the ACC ion source for low temperature melting metals for low energy metal ion implantation,
    First production and development of inline stepper motor driven substrate holders for plasma- and ion beam processing.
  • 2003:
    Production of the first broad beam ion implanter with a linear ACC ion source, (together with DMS-Dresden GmbH),
    Development of linear ACC ion- and plasma sources with ion beam length from 150 to 600 mm,
    Development of halogen lamp heaters for plasma- and ion beam processes.

 
References
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