Heaters

for Ion Beam- and Plasma Processing

Heaters for ion beam- and plasma processing operate at the temperature range up to 500 C. Mostly they are halogen lamp based and used for:

  • Substrate heater for ion beam- and plasma processing generated from plasma- and ion sources operating at high vacuum,
  • Substrate heater for plasma processing with plasma reactors or plasma sources operating in the mbar- range,
  • Heaters for heating of high temperature ion beam- and plasma sources.
Together with our Plasma- and Ion Sources and inline substrate holders cost effective systems for ion beam and plasma processing in existing or new vacuum equipment can be installed used for research and development and small scale industrial production.

The following table gives an overview about the heaters.

 

Substrate heater for plasma processing

Substrate heater for ion beam processing

Ion beam- and plasma source heater

Heater elements

halogen lamps

halogen lamps

halogen lamps

Pressure range

10-8 to 1000 mbar

< 10-2 mbar

< 10-2 mbar

Voltage

24 V

220 V

220 V

Heater power

0.1 to 3 kW

0.1 to 3 kW

0.1 to 3 kW

Thermoelement

type K

type K

type K

Control interface

analogue interface

analogue interface

analogue interface

The heaters consists of the halogen heater with dimensions dependent on the substrates and on the process equipment and of a electrical power unit with max. 3 kW heater power. The heaters used at high vacuum use halogen lamps for 220 V, the plasma process heater use 24 V halogen lamps to avoid plasma break downs and arcing. By using conventional halogen lamps cost effective solutions can be build.


 
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