PlasmaMon - a Compact and Allround Device
This our device "PlasmaMon-1" which was developed by JENION in 2003. There is an electronic unit operating with Langmuir Probes or Plasma Sheath Probes and a Retarding Field Analyzer in a compact rack. The device is PC-controlled via serial port and can be used optionally with CAN-bus (i.e. by using equipment for process control.)
Plasma Sheath Probe with electrical feedthrough in front of "PlasmaMon" |
Pressure ranges of probes
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A variety of customer and application specified solutions can be developed on the basis of PlasmaMon:
- Application specified probes, fitted on determined substrate shapes and plasma configurations,
- Probes which are embedded in insulators (simulation of plasma sheath processes on insulating substrates),
- PlasmaMon Devices with more than 16 measuring inputs (i.e.. 32 or 64 probes),
- Differential pumped retarding field analyzer für pressure range up to 3 mbar,
- Plasma sheath probes for plasmas at higher pressures up to atmospheric pressure,
- Plasma probes for process controlling in automatised thin film processes,
- Plasma sheath probes for use in coating applications.
There are three types of operations
- "Plasmaprofile":
Measuring of ion current densitiy profiles
- "Plasmaprobe":
Measuring of probe characteristics
- Retarding Field Analyzer:
Retarding field analysis
All measuring values can be stored as ASCII-file and used for further processing. |
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Screenshot in operation type "RFA - Ret. Field Analyzer" |
Technical Data of PlasmaMon:
Parameter |
Typical values |
Maximum value |
Measuring time per measuring point |
1-30 s |
>= 1s, max. 1000 s |
Vprobe |
-50 ... + 50 V |
-200 V, resp. +200 Vmax. 20 mA |
Vextract |
-100 V resp. + 100 V |
-200 V, resp. +200 Vmax. 20 mA |
Communication |
serial, 9600 baud, 8 N 1 |
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Measuring range probe current |
0.01 - 300µA |
+- 1mA |
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