PlasmaMon - a Compact and Allround Device

This our device "PlasmaMon-1" which was developed by JENION in 2003. There is an electronic unit operating with Langmuir Probes or Plasma Sheath Probes and a Retarding Field Analyzer in a compact rack. The device is PC-controlled via serial port and can be used optionally with CAN-bus (i.e. by using equipment for process control.)

Plasma Sheath Probe with electrical feedthrough in front of "PlasmaMon"

Pressure ranges of probes

A variety of customer and application specified solutions can be developed on the basis of PlasmaMon:

• Application specified probes, fitted on determined substrate shapes and plasma configurations,
• Probes which are embedded in insulators (simulation of plasma sheath processes on insulating substrates),
• PlasmaMon Devices with more than 16 measuring inputs (i.e.. 32 or 64 probes),
• Differential pumped retarding field analyzer für pressure range up to 3 mbar,
• Plasma sheath probes for plasmas at higher pressures up to atmospheric pressure,
• Plasma probes for process controlling in automatised thin film processes,
• Plasma sheath probes for use in coating applications.

There are three types of operations "Plasmaprofile": Measuring of ion current densitiy profiles "Plasmaprobe": Measuring of probe characteristics Retarding Field Analyzer: Retarding field analysis All measuring values can be stored as ASCII-file and used for further processing.

Screenshot in operation type "RFA - Ret. Field Analyzer"

Technical Data of PlasmaMon: