Content of our Website

1. About JENION (Homepage)
1.1. History
1.2. Product Overview
1.3. Recent Projects and developments
1.4. References

2. Ion- and Plasmasources
2.1. Ion Source JENION ACC-40 IS
2.1.1. Description
2.1.2. Principle
2.1.3. Application

2.2. Linear Broad Beam Ion Sources
2.2.1. Description
2.2.2. Principle
2.2.3. Application

2.3. Alternating Cold Cathode Plasma Sources
2.3.1. Description
2.3.2. Principle
2.3.3. Application

3. Applications
3.1. Ion Beam Assisted Deposition (IBAD)

3.2. Ion Implantation
3.2.1. Description
3.2.2. Technical Data
3.2.3. Application
:
- 3.2.3.1. Implantation of nitrogen, oxygen, Carbon and and noble gases
- 3.2.3.2. O2+ - Implantation for Glass Bonding
- 3.2.3.3. N2+ - Implantation in Stainless Steel
- 3.2.3.4. Nitrogen Plasma Immersion Ion Implantation (PIII)

3.3. Ion Assisted Deposition (IAD)

4. Equipment
4.1. PlasmaMon - Plasma Probe Measurement for Plasma and Ion Beam Analysis:
- 4.1.1. Problems of Plasma Analysis in Thin Film Technology
- 4.1.2. Applications
- 4.1.3. Langmuir Probe Arrays
- 4.1.4. Plasma Sheath Probe Arrays
- 4.1.5. Retarding Field Analyzer
4.2. Inline Substrate Holders
4.3. Heaters

5. Research & Development
5.1. Technique and Technology Development for Thin Film Processes with Plasma- and Ion Sources
5.2. Available Equipment and Processes
5.3. Process Simulations and complete Software Solutions
5.4. Thin Film Deposition and Job Coating
5.5. Examples and recent Projects

 
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