Content of our Website

1. About JENION (Homepage): 1.1. History; 1.2. Product Overview; 1.3. Recent Projects and developments; 1.4. References

2. Ion- and Plasmasources
2.1. Ion Source JENION ACC-40 IS: 2.1.1. Description; 2.1.2. Principle; 2.1.3. Application
2.2. Linear Broad Beam Ion Sources: 2.2.1. Description; 2.2.2. Principle; 2.2.3. Application
2.3. Alternating Cold Cathode Plasma Sources: 2.3.1. Description; 2.3.2. Principle; 2.3.3. Application

3. Applications
3.1. Ion Beam Assisted Deposition (IBAD)
3.2. Ion Implantation: 3.2.1. Description; 3.2.2. Technical Data; 3.2.3. Application; - 3.2.3.1. Implantation of nitrogen, oxygen, Carbon and and noble gases; - 3.2.3.2. O₂⁺ - Implantation for Glass Bonding; - 3.2.3.3. N₂⁺ - Implantation in Stainless Steel; - 3.2.3.4. Nitrogen Plasma Immersion Ion Implantation (PIII)
3.3. Ion Assisted Deposition (IAD)

4. Equipment: 4.1. PlasmaMon - Plasma Probe Measurement for Plasma and Ion Beam Analysis:; - 4.1.1. Problems of Plasma Analysis in Thin Film Technology; - 4.1.2. Applications; - 4.1.3. Langmuir Probe Arrays; - 4.1.4. Plasma Sheath Probe Arrays; - 4.1.5. Retarding Field Analyzer; 4.2. Inline Substrate Holders; 4.3. Heaters

5. Research & Development: 5.1. Technique and Technology Development for Thin Film Processes with Plasma- and Ion Sources; 5.2. Available Equipment and Processes; 5.3. Process Simulations and complete Software Solutions; 5.4. Thin Film Deposition and Job Coating; 5.5. Examples and recent Projects

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