Technical Data of

JENION ACC-30x150 IMP,
ACC-40 x300 IMP and ACC-40x600 IMP

The concept of ion implantation from Linear Ion Sources enables a wide range of implantation area.
The following table shows the technical data and dimensions of Broad Beam Ion Implanters basing at this concept.

Property

ACC-30x150 IMP

ACC-40x300 IMP

ACC-40x600 IMP

ion source dimensions (length x width x hight) [mm]

200 x 100 x 190

350 x 100 x 190

650 x 100 x 190

Ion beam width (at 200 mm distance)

20 30 mm

30 -60 mm

30 - 60 mm

ion beam length (at 200 mm distance)

150 mm

300 mm

600 mm

homogeneous ion beam length (at 200 mm distance, < 5%)

75 100 mm

200 250 mm

450 500 mm

ion energy

5 60 keV

5 60 keV

5 60 keV

ion current density

5 50 µAcm-2

5 50 µAcm-2

5 50 µAcm-2

ion beam

5 50 mA

10 100 mA

20 250 mA

discharge voltage

500 900 V

500 900 V

500 900 V

discharge current

25 150 mA

50 300 mA

100 500 mA

grid system

2 grid system from graphite (optional stainless steel, titanium, tungsten)

2 grid system from graphite (optional stainless steel, titanium, tungsten)

2 grid system from graphite (optional stainless steel, titanium, tungsten)

gas input

3 15 sccm

5 25 sccm

10 50 sccm

impurities (% of ion beam current density)

0.03 - 1

0.03 1

0.03 1

cooling water flow

Optional (1-3 l/min)

1-3 l/min

2-5 l/min


 
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